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The book is structured into distinct parts for effective learning. Here is the complete table of contents for the 4th edition:
Fabrication engineering is the process of creating devices, structures, and systems at the micro- and nanoscale using various techniques such as lithography, etching, and deposition. This field has gained significant attention in recent years due to its potential applications in various areas, including electronics, medicine, energy, and materials science.
Fabrication engineering at micro- and nanoscale covers methods to create structures and devices with feature sizes from ~100 micrometers down to single-digit nanometers. Applications include MEMS/NEMS, microfluidics, photonics, sensors, semiconductor devices, and nanomaterials. This guide emphasizes common processes, materials, design-for-manufacturability, metrology, and troubleshooting.
Unlike texts that focus solely on CMOS, this book dedicates significant real estate to —including bulk micromachining (KOH etching), surface micromachining (sacrificial layers), and LIGA for high-aspect-ratio structures.
The is not just a reprint. It includes significant updates and new content to reflect the modern landscape of semiconductor manufacturing.
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